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Volumn 450, Issue 1, 2004, Pages 51-59

Characterization of multilayered materials for optoelectronic components by high-resolution X-ray diffractometry and reflectometry: Contribution of numerical treatments

Author keywords

Fast Fourier transform; Opto electronic devices; Semi conductor hetero structures; Thickness determination; X Ray diffractometry; X Ray reflectometry

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; CORRELATION METHODS; FAST FOURIER TRANSFORMS; HETEROJUNCTIONS; INFRARED DETECTORS; LASER BEAMS; OPTIMIZATION; SEMICONDUCTOR QUANTUM WELLS; THICKNESS MEASUREMENT; VECTORS; X RAY DIFFRACTION;

EID: 1142303868     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.052     Document Type: Conference Paper
Times cited : (32)

References (24)
  • 24
    • 0003314824 scopus 로고    scopus 로고
    • High-Resolution X-ray scattering from Thin Films and Multilayers
    • Berlin, Heidelberg
    • High-Resolution X-ray scattering from Thin Films and Multilayers, in: V. Holý, U. Pietsch, T. Baumbach, (Eds.). Springer Tracts in Modem Physics, vol. 149, Berlin, Heidelberg (1998).
    • (1998) Springer Tracts in Modem Physics , vol.149
    • Holý, V.1    Pietsch, U.2    Baumbach, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.