Surface morphology of TiN films reactively deposited by bias sputtering

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 777-784

  Takahashi, T ^a   Masugata, K ^a   Kawai, H ^a   Kontani, S ^a   Yamamoto, J ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000967321     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00347-x     Document Type: Article

References (5)

1. Yumoto H, Kaneko K, Ishihara M, Kato Y, Akashi K. Thin Solid Films 1996;281-282:311.
2. Takahashi T, Masugata K, Iwatsubo S, Asada M. Thin Solid Films 1999;343-344:273
3. Iwatsubo S, Takahashi T, Naoe M. Thin Solid Films 1999;343-344:67
4. Tin P, Maruno S. Jpn J Appl Phys 1992;31:1446.
5. Yamazato M, Yamagata Y, Ikegami T, Ebihara K. Proceedings of the Fourth International Symposium on Sputtering and Plasma Processes. 1997. p. 635.