CARL-advantages of thin-film imaging for leading-edge lithography

Materials Science in Semiconductor Processing

Volumn 5, Issue 2-3, 2002, Pages 291-299

  Richter, E ^a   Sebald, M ^a   Chen, L ^a   Schmid, G ^a   Czech, G ^a  

^a Infineon Technolgies AG   (Germany)

Author keywords

CARL; Chemical amplification; Silylation; Thin film imaging

Indexed keywords

IMAGING TECHNIQUES; LIGHT ABSORPTION; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PHOTORESISTORS; SEMICONDUCTOR MATERIALS;

BILAYER RESIST SYSTEMS; CHEMICAL AMPLIFICATION;

THIN FILMS;

EID: 0036557715     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00107-5     Document Type: Article

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