Influence of modeling and simulation on the maturation of plasma technology: Feature evolution and reactor design

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages

  Graves, David B ^a   Kushner, Mark J ^b  

^a University of California   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHEMICAL REACTORS; COMPUTER SIMULATION; MICROELECTRONICS; MICROELECTRONIC PROCESSING; NEGATIVE IONS; OPTIMIZATION; PARTIAL DIFFERENTIAL EQUATIONS; PLASMA DEVICES; POSITIVE IONS; SURFACE ROUGHNESS;

PLASMA REACTOR DESIGN; PLASMA EQUIPMENT; PLASMA REACTOR; PLASMA TECHNOLOGY; SURFACE COMPOSITION ROUGHNESS;

PLASMAS; PLASMA THEORY;

EID: 0142058278     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1600447     Document Type: Conference Paper

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