Characteristics of rutile TiO2 films prepared by r.f. magnetron sputtering at a low temperature

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 427-430

  Okimura, Kunio ^a   Maeda, Naohiro ^a   Shibata, Akira ^a  

^a FUKUI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Optical coatings; Rutherford backscattering spectroscopy; Surface morphology; Titanium oxide

Indexed keywords

CRYSTAL STRUCTURE; ELLIPSOMETRY; FILM GROWTH; FILM PREPARATION; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; MORPHOLOGY; OPTICAL COATINGS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACES; TITANIUM DIOXIDE;

DEPOSITED FILMS; RUTILE FILMS; RUTILE STRUCTURE; SPUTTERING GAS;

THIN FILMS;

EID: 0030218708     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08659-2     Document Type: Article

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