Morphology control of films formed by atmospheric-pressure chemical vapor deposition using tetraethylorthosilicate/ozone system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 8, 1996, Pages 4438-4443

  Adachi, Motoaki ^a   Okuyama, Kikuo ^a,b   Fujimoto, Toshiyuki ^a,b   Sato, Jun Ichi ^a,c   Muroyama, Masakazu ^a,c  

^a Osaka Prefecture University   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

^c SONY CORPORATION   (Japan)

Author keywords

Atmospheric pressure CVD; Film formation; Flow shape; Morphology; Ozone; Substrate dependence; TEOS; Tetraethylorthosilicate

Indexed keywords

FILM FORMATION; FLOW SHAPE; SUBSTRATE DEPENDENCE;

ATMOSPHERIC PRESSURE; CHEMICAL REACTIONS; CONTROL; EXPERIMENTS; FILMS; MORPHOLOGY; OZONE;

CHEMICAL VAPOR DEPOSITION;

EID: 0030206878     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.4438     Document Type: Article

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