Large area thin film SI tandem module production using VHF plasma with a ladder-shaped electrode

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1849-1851

  Noda, Matsuhei ^a   Nishimiya, Tatsuyuki ^a   Yamaguchi, Kengou ^a   Kawamura, Keisuke ^a   Sonobe, Hiroshi ^a   Kuroda, Masahiro ^a   Yamada, Akira ^a   Takatsuka, Hiromu ^a   Yamauohi, Yasuhiro ^a   Takeuchi, Yoshiaki ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONCEPTUAL DIAGRAMS; LADDER-SHAPED ELECTRODES; TANDEM MODULE PROTECTION; VHF PLASMAS;

CRYSTALLINE MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILICON; SUBSTRATES; THIN FILMS;

SOLAR CELLS;

EID: 6344221990     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. M. Murata et al. "Inductively Coupled Radio Frequency Plasma Chemical Vapor Deposition Using a Ladder-Shaped Antenna", Rev. Sci. Instrum., 64 (4), 1542 (1996).
2. H. Yamakoshi et al. "VHP Plasma CVD Using a Ladder-Shaped Electrode", Proc. of the 15th Symposium on Plasma Processing, 522 (1998).
3. Y. Takeuchi et al. "Preparation of Large Uniform Amorphous Silicon Films by VHF-PECVD Using a Ladder-Shaped Antenna", Thin Solid Films, 386, 133 (2001).
4. L. Sansonners et al. "A voltage uniformity study in large-area reactors for RF plasma deposition", Plasma Sources Sci. Technol.6, 170 (1997).
5. J. Kuske et al. "Power Feeding in Large Area PECVD of Amorphous Silicon", Mat. Res. Soc. Symp. Proc., 377, 27 (1995).