Spatially resolved mass spectrometric sampling of inductively coupled plasmas using a movable sampling orifice

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1971-1977

  Li, Xi ^a,d   Oehrlein, Gottlieb S ^a,d   Schaepkens, Marc ^b,d   Ellefson, Robert E ^c   Frees, Louis C ^c  

^a UNIVERSITY OF MARYLAND   (United States)

^b GENERAL ELECTRIC COMPANY   (United States)

^c Inficon Incorporated   (United States)

^d STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC DISCHARGES; ETCHING; FLUOROCARBONS; IONIZATION; KINETIC THEORY; MASS SPECTROMETRY; ORIFICES; PLASMA DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA HEATING; TEMPERATURE MEASUREMENT;

DISCHARGE PROPERTIES; ELECTRON IONIZATION ENERGIES; FLUORCARBON DISCHARGES; HIGH DENSITY DISCHARGES; HIGH DENSITY PLASMAS; SPATIALLY RESOLVED MASS SPECTROMETRIC SAMPLING;

INDUCTIVELY COUPLED PLASMA;

EID: 0842290153     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1619413     Document Type: Article

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