Submicron-resolution ablation with a KrF excimer laser beam patterned with a projection lens

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

  Weisbuch, F ^a   Lazare, S ^a   Goodall, F N ^b   Debarre D ^c  

^a UNIVERSITÉ DE BORDEAUX   (France)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 25344435507     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051428     Document Type: Article

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