Laser ablation patterning of dielectric layer stacks for 193 nm mask fabrication

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4426, Issue , 2002, Pages 437-440

  Ihlemann, Jürgen ^a   Rubahn, Katharina ^a,b   Thielsch, Roland ^c,d  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^b UNIVERSITY OF SOUTHERN DENMARK   (Denmark)

^c FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^d Southwall Europe GmbH   (Germany)

Author keywords

Ablation; Dielectric layer; HfO2; Mask fabrication; SiOx

Indexed keywords

ALUMINA; DIELECTRIC MATERIALS; FUSED SILICA; HEAT TREATMENT; LIGHT ABSORPTION; MASKS;

MASK FABRICATION;

LASER ABLATION;

EID: 0036387553     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.456875     Document Type: Article

References (15)

1. J.R. Lankard, G. Wolbold: Appl. Phys. A 54, 355 (1992).
2. M.C. Gower, P.T. Rumsby: Excimer laser projector for materials processing applications, in: Laser ablation of electronic materials, E. Fogarassy, S. Lazare (Editors), Elsevier 1992, p. 255.
3. J. Siegel, K. Ettrich, E. Welsch, E. Matthias: Appl. Phys. 64, 213 (1997).
4. J.L. Speidell, D.P. Pulaski, R.S. Patel: IBM Journal of Research and Development 41(1/2) (1997).
5. J. Ihlemann, K. Rubahn: Appl. Surf. Sci. 154-155, 587 (2000).
6. D. Schäfer, J. Ihlemann, G. Marowsky, P.R. Herman: Appl. Phys. A 72, 377 (2001).
7. Patent application DE 10017614.3.
8. J. Ihlemann, B. Wolff-Rottke: Appl. Surf. Sci. 86, 228 (1995).
9. K. Rubahn, J. Ihlemann: Appl. Surf. Sci. 127-129, 881 (1998).
10. K. Rubahn, J. Ihlemann: Mat. Res. Soc. Symp. Proc. Vol. 526, 137 (1998).
11. K. Rubahn, J. Ihlemann, F. Balzer, H.-G. Rubahn: Proc. SPIE Vol. 3618, 357 (1999).
12. E. Matthias, M. Reichling, J. Siegel, O.W. Käding, S. Petzoldt, H. Skurk, P. Bizenberger, E. Neske: Appl. Phys. A 58, 129 (1994).
13. N. Kaiser, H. Uhlig, U.B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva: Thin Solid Films 260, 86 (1995).
14. H.A. McLeod: Proc. SPIE 652, 222 (1986).
15. S. Blum, K.H. Brown, R. Srinivasan: Appl. Phys. Lett. 43, 1026 (1983).