Nano/micro-patterning of anatase TiO2 thin film from an aqueous solution by site-selective elimination method

Science and Technology of Advanced Materials

Volumn 4, Issue 5, 2003, Pages 461-467

  Masuda, Yoshitake ^a   Saito, Noriko ^b   Hoffmann, Rudolf ^c   De Guire, Mark R ^d   Koumoto, Kunihito ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^d Case Western Reserve University   (United States)

Author keywords

Aqueous solution; Green and sustainable chemistry; Green chemistry; Self assembled monolayer; Site selective deposition; Site selective elimination; Soft solution process; Thin film; Titanium dioxide; Ultrasonication

Indexed keywords

ADHESION; ATMOSPHERIC PRESSURE; COMPOSITION; CRYSTAL STRUCTURE; DEPOSITION; ETCHING; MONOLAYERS; NANOTECHNOLOGY; NUCLEATION; PHOTOLITHOGRAPHY; SELF ASSEMBLY; SOLUTIONS; SUBSTRATES; THERMAL EFFECTS; TITANIUM DIOXIDE; ULTRASONIC APPLICATIONS;

GREEN CHEMISTRY; SITE-SELECTIVE DEPOSITION; SITE-SELECTIVE ELIMINATION; SOFT SOLUTION PROCESS; ULTRASONICATION;

THIN FILMS;

EID: 0347602013     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.stam.2003.08.002     Document Type: Article

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