Effect of high pressure isostatic annealing on oxygen segregation in Czochralski silicon

Journal of Applied Physics

Volumn 94, Issue 12, 2003, Pages 7476-7482

  Binetti, Simona ^a   Le Donne, Alessia ^a   Emtsev, Vadim V ^b   Pizzini, Sergio ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYOGENICS; CRYSTAL GROWTH FROM MELT; DISLOCATIONS (CRYSTALS); HIGH PRESSURE EFFECTS; HYDROSTATIC PRESSURE; PHOTOLUMINESCENCE; REACTION KINETICS; THERMAL EFFECTS;

HIGH PRESSURE ISOSTATIC ANNEALING; MOLAR VOLUMES;

SILICA;

EID: 0347566332     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1626801     Document Type: Article

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