High quality SiO2 depositions from TEOS by ECR plasma

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 397-400

  Sano, K ^a   Hayashi, S ^a   Wickramanayaka, S ^b   Hatanaka, Y ^b  

^a SUZUKI MOTOR CORPORATION   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Chemical vapour deposition; Dielectrics; Plasma processing and deposition; Silicon oxide

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; OXYGEN; PLASMA APPLICATIONS; PLASMAS; SILICA; SUBSTRATES; SURFACE TREATMENT; SURFACES;

PLASMA DEPOSITION; PLASMA GAS; PLASMA PROCESSING; STEP COVERAGE; TETRAETHYLOXYSILANE;

THIN FILMS;

EID: 0030217658     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08701-9     Document Type: Article

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