Growth of Hafnium Dioxide Thin Films by Liquid-Injection MOCVD Using Alkylamide and Hydroxylamide Precursors

Advanced Materials

Volumn 15, Issue 24, 2003, Pages 309-314

  Williams, Paul A ^b   Jones, Anthony C ^a   Tobin, Neil L ^a   Chalker, Paul R ^a   Taylor, Stephen ^a   Marshall, Paul A ^a   Bickley, Jamie F ^a   Smith, Lesley M ^b   Davies, Hywel O ^b   Critchlow, Gary W ^c  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b Epichem Ltd   (United Kingdom)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

Alkylamide ligands; Hafnium dioxide; Hydroxylamide ligands; Liquid injection MOCVD

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; CRYSTAL STRUCTURE; DIELECTRIC FILMS; HYSTERESIS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTRONICS; MONOMERS; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ALKYLAMIDE LIGANDS; COLUMNAR STRUCTURES; HAFNIUM DIOXIDE; HYDROXYLAMIDE LIGANDS; VAPOR-PHASE TRANSPORT;

HAFNIUM COMPOUNDS;

EID: 0345869696     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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