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Volumn 19, Issue 1, 2001, Pages 41-48

Investigating yield loss caused by airborne organophosphates

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0345775583     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (14)

References (16)
  • 1
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    • Correlating Organophosphorous Contamination on Wafer Surfaces with HEPA-Filter Installation
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    • (1992) Microcontamination , vol.10 , Issue.10 , pp. 35-37
    • Mori, E.1    Dowdy, J.D.2    Shive, L.W.3
  • 2
    • 0030244894 scopus 로고    scopus 로고
    • Unintentional Doping of Wafers Due to Organophosphates in the Cleanroom Ambient
    • JA Lebens et al., "Unintentional Doping of Wafers Due to Organophosphates in the Cleanroom Ambient," Journal of the Electrochemical Society 143, no. 9 (1996): 2906-2909.
    • (1996) Journal of the Electrochemical Society , vol.143 , Issue.9 , pp. 2906-2909
    • Lebens, J.A.1
  • 3
    • 0030677438 scopus 로고    scopus 로고
    • Evaluation of Contaminants in the Cleanroom Atmosphere and on Silicon Wafer Surface (II): Organic Compounds Contamination
    • Santa Clara, CA: Semiconductor Pure Water and Chemical Conference
    • T Fujimoto et al., "Evaluation of Contaminants in the Cleanroom Atmosphere and on Silicon Wafer Surface (II): Organic Compounds Contamination," in Proceedings of the Semiconductor Pure Water and Chemical Conference (Santa Clara, CA: Semiconductor Pure Water and Chemical Conference, 1997), 157-166.
    • (1997) Proceedings of the Semiconductor Pure Water and Chemical Conference , pp. 157-166
    • Fujimoto, T.1
  • 5
    • 0030350836 scopus 로고    scopus 로고
    • Identification of Organic Contamination in Cleanroom Air, on Wafers and Outgassing from Gloves and Wafer Shippers
    • Santa Clara, CA: Semiconductor Pure Water and Chemical Conference
    • MJ Camenzind, "Identification of Organic Contamination in Cleanroom Air, on Wafers and Outgassing from Gloves and Wafer Shippers," in Proceedings of the Semiconductor Pure Water and Chemical Conference (Santa Clara, CA: Semiconductor Pure Water and Chemical Conference, 1996), 352-372.
    • (1996) Proceedings of the Semiconductor Pure Water and Chemical Conference , pp. 352-372
    • Camenzind, M.J.1
  • 8
    • 0346768291 scopus 로고
    • Outgassing: Advanced Detection and Control Techniques
    • February
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    • (1995) Cleanrooms , pp. 23
    • Simonson, R.J.1    Thornberg, S.M.2    Liang, A.Y.3
  • 9
    • 0029734149 scopus 로고    scopus 로고
    • Particle Formation of Materials Outgassed from Silicone Sealants by Corona-Discharge Ionizers
    • N Namaiki et al., "Particle Formation of Materials Outgassed from Silicone Sealants by Corona-Discharge Ionizers," Journal of the Institute of Environmental Sciences (1996): 26.
    • (1996) Journal of the Institute of Environmental Sciences , pp. 26
    • Namaiki, N.1
  • 10
    • 0030373429 scopus 로고    scopus 로고
    • Evaluation of Contaminants in the Cleanroom Atmosphere and on Silicon Wafer Surfaces
    • Santa Clara, CA: Semiconductor Pure Water and Chemical Conference
    • T Fujimoto et al., "Evaluation of Contaminants in the Cleanroom Atmosphere and on Silicon Wafer Surfaces," in Proceedings of the Semiconductor Pure Water and Chemical Conference (Santa Clara, CA: Semiconductor Pure Water and Chemical Conference, 1996), 325-351.
    • (1996) Proceedings of the Semiconductor Pure Water and Chemical Conference , pp. 325-351
    • Fujimoto, T.1
  • 11
    • 0029386971 scopus 로고
    • How Clean Is Your Cleanroom Air?
    • MJ Camenzind et al., "How Clean Is Your Cleanroom Air?" MICRO 13, no. 9 (1995): 49-54.
    • (1995) MICRO , vol.13 , Issue.9 , pp. 49-54
    • Camenzind, M.J.1
  • 12
    • 0030242410 scopus 로고    scopus 로고
    • Chemically Clean Air: An Emerging Issue in the Fab Environment
    • J Mikulsky, "Chemically Clean Air: An Emerging Issue in the Fab Environment," Semiconductor International 19, no. 10 (1996): 115-122.
    • (1996) Semiconductor International , vol.19 , Issue.10 , pp. 115-122
    • Mikulsky, J.1
  • 13
    • 6744245561 scopus 로고    scopus 로고
    • Analytical Technique Compares Dopants in Fab Air and on Wafers
    • J Wang and MK Balazs, "Analytical Technique Compares Dopants in Fab Air and on Wafers," Semiconductor International 23, no. 3 (2000): 99-104.
    • (2000) Semiconductor International , vol.23 , Issue.3 , pp. 99-104
    • Wang, J.1    Balazs, M.K.2
  • 14
    • 0028498297 scopus 로고
    • Volatile Cleanroom Contaminants: Sources and Detection
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    • (1994) Solid State Technology , vol.37 , Issue.9 , pp. 61-72
    • Muller, A.J.1
  • 15
    • 0012714488 scopus 로고    scopus 로고
    • Standard Test Methods for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography
    • ASTM F1982-99, West Conshohocken, PA: ASTM
    • ASTM F1982-99, "Standard Test Methods for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography," in Annual Book of ASTM Standards 11.03 (West Conshohocken, PA: ASTM, 1997), 1-6.
    • (1997) Annual Book of ASTM Standards 11.03 , pp. 1-6
  • 16
    • 0031388659 scopus 로고    scopus 로고
    • Organic Outgassing from Cleanroom Materials including HEPA/ULPA Filter Components: Standardized Testing Proposal
    • Mount Prospect, IL: IES
    • M Camenzind and A Kumar, "Organic Outgassing from Cleanroom Materials including HEPA/ULPA Filter Components: Standardized Testing Proposal," in Proceedings of the Annual Meeting of the Institute of Environmental Sciences (Mount Prospect, IL: IES, 1997), 211-226.
    • (1997) Proceedings of the Annual Meeting of the Institute of Environmental Sciences , pp. 211-226
    • Camenzind, M.1    Kumar, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.