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Volumn 19, Issue 10, 1996, Pages 115-122

Chemically clean air: An emerging issue in the fab environment

Author keywords

Clean air; Contamination control; Particle measurements

Indexed keywords

CLEAN ROOMS; CONTAMINATION; INDOOR AIR POLLUTION; PARTICLES (PARTICULATE MATTER);

EID: 0030242410     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (7)

References (11)
  • 1
    • 0030350836 scopus 로고    scopus 로고
    • Identification of Organic Contamination in Cleanroom Air, on Wafers and Outgassing from Gloves and Wafer Shippers
    • M. Camenzind, "Identification of Organic Contamination in Cleanroom Air, on Wafers and Outgassing from Gloves and Wafer Shippers," Proceedings of Semiconductor Pure Water and Chemicals Conference, 1996, p. 352.
    • (1996) Proceedings of Semiconductor Pure Water and Chemicals Conference , pp. 352
    • Camenzind, M.1
  • 4
    • 0028498297 scopus 로고
    • Volatile Cleanroom Contaminants; Sources and Detection
    • September
    • A. Muller et al., "Volatile Cleanroom Contaminants; Sources and Detection," Solid State Technology, September 1994, p. 61.
    • (1994) Solid State Technology , pp. 61
    • Muller, A.1
  • 5
    • 30944451081 scopus 로고
    • December
    • Balazs News, December 1995.
    • (1995) Balazs News
  • 9
    • 0026944802 scopus 로고
    • Correlating Organophosphorus Contamination on Wafer Surfaces with HEPA Filter Installation
    • November
    • E. Mori et al., "Correlating Organophosphorus Contamination on Wafer Surfaces with HEPA Filter Installation," Microcontamination, November 1992, p. 35.
    • (1992) Microcontamination , pp. 35
    • Mori, E.1
  • 11
    • 0029386971 scopus 로고
    • How Clean is Your Cleanroom Air?
    • October
    • M.J. Camenzind et al., "How Clean is Your Cleanroom Air?" Micro, October 1995.
    • (1995) Micro
    • Camenzind, M.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.