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Volumn , Issue , 1996, Pages 352-372
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Identification of organic contamination in cleanroom air, on wafers and outgassing from gloves and wafer shippers
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CLEAN ROOMS;
CONTAMINATION;
DESORPTION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
GAS CHROMATOGRAPHY;
GASES;
PARTICLES (PARTICULATE MATTER);
SECONDARY ION MASS SPECTROMETRY;
SILICON WAFERS;
WATER;
X RAY PHOTOELECTRON SPECTROSCOPY;
ORGANIC CONTAMINANTS;
THERMAL DESORPTION;
ULTRAPURE WATER;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0030350836
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (4)
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References (16)
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