Minute current detection during anodic oxidation by atomic force microscope at high humidity

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 9 A, 2003, Pages 5892-5895

  Kuramochi, Hiromi ^a,b   Ando, Kazunori ^a,b   Yokoyama, Hiroshi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

Author keywords

Anodic oxidation; Atomic force microscope; Faradaic current; Humidity; Minute current detection; Nano oxidation

Indexed keywords

ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC CURRENTS; FARADAY EFFECT; LEAKAGE CURRENTS; NANOSTRUCTURED MATERIALS; SPURIOUS SIGNAL NOISE;

FARADAIC CURRENT; HUMIDITY EFFECTS; LEAKAGE CURRENT NOISE; MINUTE CURRENT DETECTION;

ANODIC OXIDATION;

EID: 0344925524     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.5892     Document Type: Article

References (23)

1. J. A. Dagata, J. Schneir, H. H. Harary, C. J. Evans, M. T. Postek and J. Benett: Appl. Phys. Lett. 56 (1990) 2001.
2. E. S. Snow and P. M. Cambell: Appl. Phys. Lett. 64 (1994) 1932.
3. E. S. Snow, W. H. Juan, S. W. Pang and P. M. Cambell: Appl. Phys. Lett. 66 (1995) 1729.
4. F. Pérez-Murano, G. Abadal, N. Barniol, X. Aymerich, J. Servat, P. Gorostiza and F. Sanz: J. Appl. Phys. 78 (1995) 6797.
5. J. A. Dagata: Science 270 (1995) 1625.
6. Ph. Avouris, T. Hertel and R. Martel: Appl. Phys. Lett. 71 (1997) 285.
7. Ph. Avouris, R. Martel, T. Hartel and R. Sandstrom: Appl. Phys. A 66 (1998) S659.
8. J. A. Dagata, T. Inoue, J. Itoh, K. Matsumoto and H. Yokoyama: Appl. Phys. Lett. 73 (1998) 271.
9. P. A. Fontaine, E. Dubois and D. Stievenard: J. Appl. Phys. 84 (1998) 1776.
10. F. Pérez-Murano, K. Birkelund, K. Morimoto and J. A. Dagata: Appl. Phys. Lett. 75 (1999) 199.
11. K. Morimoto, F. Pérez-Murano and J. A. Dagata: Appl. Surf. Sci. 158 (2000) 205.
12. H. Sugimura and N. Nakagiri: J. Appl. Phys. 34 (1995) 3406.
13. R. Garcia, M. Calleja and H. Rohrer: J. Appl. Phys. 86 (1999) 1898.
14. F. Pérez-Murano, C. Martin, N. Barnil, H. Kuramochi, H. Yokoyama and J. A. Dagata: Appl. Phys. Lett. 82 (2003) 3086.
15. H. Kuramochi, K. Ando and H. Yokoyama: to be published in Surf. Sci.
16. T. Hattori, Y. Ejiri, K. Saito and M. Yasutake: J. Vac. Sci. Technol. A 12 (1994) 2586.
17. T. Teuschler, K. Mahr, S. Miyazaki, M. Hundhausen and L. Ley: Appl. Phys. Lett. 67 (1995) 3144.
18. E. S. Snow, P. M. Cambell and B. v. Shanabrook: Appl. Phys. Lett. 63 (1993) 3488.
19. E. S. Snow and P. M. Cambell: Science 270 (1995) 1639.
20. R. Held, T. Heinzel, P. Studerus, K. Ensslin and M. Holland: Appl. Phys. Lett. 71 (1997) 2689.
21. K. Matsumoto, Y. Gotoh, T. Maeda, J. A. Dagata and J. S. Harris: Appl. Phys. Lett. 76 (2000) 239.
22. Y. Okada, Y. Iuchi, M. Kawabe and J. S. Harris, Jr.: J. Appl. Phys. 88, (2000) 1136.
23. T. Onuki, T. Tokizaki, Y. Watanabe, T. Tsuchiya and T. Tani: Appl. Phys. Lett. 80 (2002) 4629.