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Volumn 79, Issue 11, 1996, Pages 8258-8268

Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000499628     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362701     Document Type: Review
Times cited : (32)

References (29)
  • 17
    • 0027809288 scopus 로고
    • edited by G. K. Celler and J. R. Maldonado Materials Research Society, San Francisco, CA
    • M. Chaker, J. F. Pelletier, and J. C. Kieffer, in Materials Aspects of X-ray Lithography, edited by G. K. Celler and J. R. Maldonado (Materials Research Society, San Francisco, CA, 1993), pp. 151-167.
    • (1993) Materials Aspects of X-ray Lithography , pp. 151-167
    • Chaker, M.1    Pelletier, J.F.2    Kieffer, J.C.3
  • 22
    • 85033009641 scopus 로고    scopus 로고
    • Princeton Instruments, Inc., 3660 Quakerbridge Rd., Trenton, NJ 08619
    • Princeton Instruments, Inc., 3660 Quakerbridge Rd., Trenton, NJ 08619.
  • 27
    • 85033005354 scopus 로고    scopus 로고
    • Lebow Company, 5960 Mandarin Avenue, Goleta, CA 93117
    • Lebow Company, 5960 Mandarin Avenue, Goleta, CA 93117.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.