Wafer and reticle positioning system for the Extreme Ultraviolet Lithography Engineering Test Stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 829-839

  Wronosky, John B ^a   Smith, Tony G ^a   Craig, Marcus J ^a   Sturgis, Beverly R ^a   Darnold, Joel R ^a   Werling, David K ^a   Kincy, Mark A ^a   Tichenor, Daniel A ^a   Williams, Mark E ^a   Bischoff, Paul ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL SYSTEMS; INTEGRATED CIRCUIT MANUFACTURE; MAGNETIC LEVITATION; MATHEMATICAL MODELS; POSITION CONTROL; ULTRAVIOLET RADIATION;

CONTROL ELECTRONICS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033681615     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)