Thin film transistors on nanocrystalline silicon directly deposited by a microwave plasma CVD

Solid-State Electronics

Volumn 48, Issue 2, 2004, Pages 309-314

  Teng, L H ^a   Anderson, W A ^a  

^a the State University of New York   (United States)

Author keywords

Liquid crystal display; Microwave plasma ECR CVD; Nanocrystalline silicon; Thin film transistor

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COST EFFECTIVENESS; GLASS; IONIZATION; LIQUID CRYSTAL DISPLAYS; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON;

IONIZATION RATIO;

THIN FILM TRANSISTORS;

EID: 0242654097     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(03)00303-4     Document Type: Article

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