Structural and electrical properties of thin microcrystalline silicon films deposited by an electron cyclotron resonance plasma discharge of 2% SiH4/Ar further diluted in H2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 5, 1998, Pages 2751-2756

  Jagannathan, B B ^a   Wallace, R L ^a   Anderson, W A ^a  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032371070     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581481     Document Type: Article

References (29)

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