Determination of the equilibrium ion sheath in the drifting plasma by numerical simulation

IEEE Transactions on Plasma Science

Volumn 31, Issue 5 II, 2003, Pages 1044-1051

  Kwok, Dixon Tat Kun ^a   Oates, Thomas W H ^a   McKenzie, David R ^a   Bilek, Marcela M M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Child Langmuir law; Langmuir probe; Particle in cell (PIC); Plasma measurements; Plasma sheaths; Simulation

Indexed keywords

APPROXIMATION THEORY; IONS; MATHEMATICAL MODELS; NUMERICAL METHODS; PLASMA SIMULATION;

DRIFTING PLASMA; EQUILIBRIUM ION SHEATH; EQUILIBRIUM STEADY STATE SHEATH; LANGMUIR PROBE; PLASMA MEASUREMENTS;

PLASMA SHEATHS;

EID: 0242355118     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.818766     Document Type: Article

References (24)

1. T. A. Edison, "Art of plating one material with another," Patent U.S. 526 147, Sept. 18, 1894.
2. A.Andre Anders, "Energetic deposition using filtered cathodic arc plasmas," Vacuum, vol. 67, pp. 673-686, 2002.
3. Y. X. Leng, J. Y. Chenb, Z. M. Zeng, X. B. Tian, P. Yang, N. Huang, Z. R. Zhou, and P. K. Chu, "Properties of titanium oxide biomaterials synthesized by titanium plasma immersion ion implantation and reactive ion oxidation," Thin Solid Films, vol. 277-278, pp. 377-378, 2000.
4. P. Favia and R. d'Agostino, "Plasma treatments and plasma deposition of polymers for biomedical applications," Surf. Coatings Technol., vol. 98, pp. 1102-1106, 1998.
5. P. K. Chu, J. Y. Chen, L. P. Wang, and N. Huang, "Plasma surface modification of biomaterials," Mater. Sci. Eng. R36, pp. 143-206, 2002.
6. S. Mandl and B. Rauschenbach, "Improving the biocompatibility of medical implants with plasma immersion ion implantation," Surface Coatings Technol., vol. 156, pp. 276-283, 2002.
7. M. Ueda, R. S. Dallaqua, J. O. Rossi, I. H. Tan, E. Abramof, A. F. Beloto, and E. D. Bosco, "Arc plasma ion implantation of materials used in aerospace applications," in PPPS-2001 Pulsed Power Plasma Science 2001, Las Vegas, NV, 2001.
8. M. Ueda, L. A. Berni, R. M. Castro, A.F. Beloto, E. Abramof, J. O. Rossi, J. J. Barroso, and C. M. Lepienski, "Surface improvements of industrial components treated by plasma immersion ion implantation (PIII): Results and prospects," Surface Coatings Technol., vol. 156, pp. 71-76, 2002.
9. X. X. Ma, K. Yukimura, and T. Muraho, "A study on plasma behavior in the 80 mm-diameter pipe during deposition TiN film by PBII & D measured by Langmuir probe," in 13th Int. Conf. Ion Beam Modification Materials (IBMM2002), Kobe, Japan, 2002.
10. R. N. Tarrant, N. Fujisawa, M. V. Swain, N. L. James, D. R. McKenzie, and J. C. Woodard, "PBII deposition of thick carbon coatings from a cathodic arc plasma," Surface Coatings Technol., vol. 156, pp. 143-148, 2002.
11. M. M. M. Bilek, D. R. McKenzie, R. N. Tarrant, S. H. M. Lim, and D. G. McCulloch, "Plasma-based ion implantation utilising a cathodic arc plasma," Surface Coatings Technol., vol. 156, pp. 136-142, 2002.
12. R. Huber, D. Manova, S. Mandl, and B. Rauschenbach, "Lateral texture evolution during formation of TiN by MePIIID," Surface Coatings Technol., vol. 156, pp. 176-181, 2002.
13. C. Fitz, W. Fukarek, and W. Moller, "Stress relaxation and phase stability of cubic boron nitride films during ion post implantation and annealing," Thin Solid Films, vol. 408, pp. 155-159, 2002.
14. I. G. Brown, O. R. Monteiro, and M. M. M. Bilek, "High voltage sheath behavior in a drifting plasma," Appl. Phys. Lett., vol. 74, pp. 2426-2428, 1999.
15. A.Andre Anders, "Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: Measurements and analytical considerations," Surface Coatings Technol., vol. 136, pp. 85-92, 2001.
16. J. T. Scheuer, M. Shamim, and J. R. Conrad, "Model of plasma source ion implantation in planar, cylindrical, and spherical geometries," J. Appl. Phys., vol. 67, pp. 1241-1245, 1990.
17. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. New York: Wiley, 1994.
18. 3 plasma doping," J. Appl. Phys., vol. 88, pp. 3198-3201, 2000.
19. A. Anders, "Ion charge state distributions of vacuum arc plasmas-the origin of species," Phys. Rev. E, vol. 55, pp. 969-981, 1997.
20. E. M. Oks, A. Anders, I. G. Brown, M. R. Dickinson, and R. A. MacGill, "Ion charge state distributions in high current vacuum arc plasma in a magnetic field," IEEE Trans. Plasma Sci., vol. 24, pp. 1174-1183, 1996.
21. J. Kutzner and H. C. Miller, "Integrated ion flux emitted from the cathode spot region of a diffuse vacuum arc," J. Phys. D-Appl. Phys., vol. 25, pp. 686-693, 1992.
22. T. W. H. Oates, J. Pigott, D. R. McKenzie, and M. M. M. Bilek, "Electric probe measurements of high voltage sheath collapse in cathodic arc plasmas due to surface charging of insulators," IEEE Trans. Plasma Sci., 2003.
23. D. T. K. Kwok, R. K. Y. Fu, and P. K. Chu, "Two dimensional particle-in-cell plasma immersion ion implantation simulation of gear/windmill geometry in cylindrical coordinates along the (r - θ) plane," Surface Coatings Technol., vol. 156, pp. 97-102, 2002.
24. M. M. M. Bilek, "Sheath structure for achieving stable metal ion implantation in a vacuum arc plasma source," J. Appl. Phys., vol. 89, pp. 923-927, 2001.