Oxygen atom-induced D 2 and D 2 O desorption on D/Si(1 1 1) surfaces

Applied Surface Science

Volumn 220, Issue 1-4, 2003, Pages 1-6

  Rahman, F ^a   Khanom, F ^a   Inanaga, S ^a   Tsurumaki, H ^a   Namiki, A ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Radio frequency; Semiconductors; Spectroscopy

Indexed keywords

MASS SPECTROMETRY; REACTION KINETICS; SPECTROSCOPIC ANALYSIS;

RADIO FREQUENCY;

DESORPTION;

EID: 0142217310     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00864-X     Document Type: Article

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