Abstraction and desorption kinetics in the reaction of H+D/Si(100) and the relation to surface structure

Journal of Chemical Physics

Volumn 117, Issue 24, 2002, Pages 11336-11346

  Kubo, Atsushi ^a,b   Ishii, Yasuhiro ^a,b,c   Kitajima, Masahiro ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSTRACTION; DIHYDRIDES; DOUBLE DIHYDRIDES DESORPTION; MONOHYDRIDE DIMER;

ACTIVATION ENERGY; ATOMS; DESORPTION; DEUTERIUM; HYDRIDES; MASS SPECTROMETERS; PROBABILITY; REACTION KINETICS; SEMICONDUCTING SILICON; SURFACE STRUCTURE; THERMAL EFFECTS; ULTRAHIGH VACUUM;

SURFACES;

EID: 0037461486     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1522394     Document Type: Article

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