Atomic oxygen-induced surface processes: D2O formation and D2 desorption on the D/Si(100) surface

Applied Surface Science

Volumn 167, Issue 1, 2000, Pages 94-98

  Shimokawa, S ^a   Khanom, F ^a   Fujimoto, T ^a   Inanaga, S ^a   Namiki, A ^a   Ando, T ^b  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; DESORPTION; HYDROGEN BONDS; MASS SPECTROMETRY; OXYGEN; SILICA; SPECTROSCOPIC ANALYSIS;

ATOMIC OXYGEN-INDUCED SURFACE REACTIONS;

DEUTERIUM COMPOUNDS;

EID: 0034300176     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00524-9     Document Type: Article

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