Field emission characteristics of amorphous diamond

Journal of the American Ceramic Society

Volumn 86, Issue 9, 2003, Pages 1513-1517

  Kan, Ming Chi ^a   Huang, Jow Lay ^a   Sung, James ^b,c,d   Lii, Ding Fwu ^e   Chen, Kuei Hsien ^f  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b KINIK Company   (Taiwan)

^c NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^d NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^e CHENG SHIU UNIVERSITY   (Taiwan)

^f ACADEMIA SINICA   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; DEPOSITION; ELECTRIC CURRENTS; ELECTRON SPECTROSCOPY; FIELD EMISSION DISPLAYS; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON;

AMORPHOUS DIAMOND; CATHODIC ARC; FOWLER-NORDHEIM EQUATION; GEOMETRICAL ENHANCEMENT FACTORS;

DIAMOND LIKE CARBON FILMS;

EID: 0142087579     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2003.tb03506.x     Document Type: Article

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