Electron field emission from undoped and doped DLC films

Materials Research Society Symposium - Proceedings

Volumn 558, Issue , 2000, Pages 577-582

  Litovchenko, V G ^a   Evtukh, A A ^a   Klyui, N I ^a   Litvin, Y M ^a   Kudzinovsky, S Y ^a   Chakhovskoi, A G ^a   Felter, T E ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DOPING (ADDITIVES); ELECTRON EMISSION; ELECTRON TUNNELING; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THRESHOLD VOLTAGE;

DIAMOND LIKE CARBON FILMS; ELECTRON FIELD EMISSION; EMISSION CURRENT MEASUREMENT; FOWLER-NORDHEIM PLOTS;

DIAMOND FILMS;

EID: 0033688645     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)