Direct ion beam deposited carbon films and clusters

Vacuum

Volumn 72, Issue 2, 2003, Pages 193-198

  Kopustinskas, V ^a   Meskinis, S ^a   Tamulevicius, S ^a   Niaura, G ^b   Guobiene, A ^a,c   Grigaliunas, V ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^b CENTER FOR PHYSICAL SCIENCES AND TECHNOLOGY   (Lithuania)

^c KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Carbon clusters; Carbon films; Catalytic Ni film; Effects of deposition temperature

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; CATALYSIS; DEPOSITION; MICROSTRUCTURE; MORPHOLOGY; NICKEL; RAMAN SPECTROSCOPY; SILICA; SILICON WAFERS; STRUCTURE (COMPOSITION); SURFACE PHENOMENA;

SHEET RESISTANCE;

DIAMOND LIKE CARBON FILMS;

EID: 0141887185     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(03)00145-3     Document Type: Article

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