Amorphous carbon films deposited from carbon ions extracted from a discharge in fullerene vapor

Journal of Applied Physics

Volumn 87, Issue 9 I, 2000, Pages 4223-4229

  Maiken, E B ^a,b   Taborek, P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b N and K Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141909863     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373056     Document Type: Article

References (24)

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