SCOPUS 정보 검색 플랫폼

Volumn 4344, Issue 1, 2001, Pages 436-446

Asymmetric line profile measurement using angular scatterometry

Author keywords

Asymmetric; Asymmetry; CD; Diffract; Metrology; Optical; Profile; Scatterometry; Sidewall

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROMAGNETIC WAVE DIFFRACTION; PHOTORESISTS; POLYSILICON; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

SCATTEROMETRY;

LIGHT SCATTERING;

EID: 0034763362 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.436769 Document Type: Article

Times cited : (6)

References (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.