Precision and accuracy of CD-SEM profile reconstruction for the 110 technology node

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2003, Pages 53-58

  Marschner, T ^a   Stief, C ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Applied Materials   (Germany)

Author keywords

CD metrology; CD SEM; Line edge roughness; Profile reconstruction

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; IMAGING TECHNIQUES; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

LINE EDGE ROUGHNESS; SIDE WALL ANGLE DETERMINATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0037506799     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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