CD SEM edge width applications and analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 315-323

  Solecky, Eric ^a   Cornell, Roger ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPES (CD-SEM);

PHOTOLITHOGRAPHY;

EID: 0032651331     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350820     Document Type: Conference Paper

References (2)