Simulation of imaging and stray light effects in immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 700-712

  Hafeman, Scott ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aerial image; Immersion; Polarization; Transmission cross coefficient; Vector imaging

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; IMAGE QUALITY; LASER PULSES; LIGHT POLARIZATION; LIGHT SCATTERING; VECTORS;

AERIAL IMAGE; CRITICAL DIMENSION; IMMERSION LITHOGRAPHY; TRANSMISSION CROSS COEFFICIENT; VECTOR IMAGING;

LITHOGRAPHY;

EID: 0141610633     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485460     Document Type: Conference Paper

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