Preliminary microfluidic simulation for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 713-723

  Wei, Alexander ^a   Nellis, Greg ^a   Abdo, Amr ^a   Engelstad, Roxann ^a   Chen, Chen Fu ^a   Switkes, Michael ^b   Rotheschild, Mordechai ^b  

^a University of Wisconsin Madison   (United States)

^b MIT LINCOLN LABORATORY   (United States)

Author keywords

Computational fluid dynamics simulations; Immersion lithography; Optical reticles

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; GRADIENT INDEX OPTICS; LIGHT REFRACTION; MICROOPTICS; OPTICAL INSTRUMENT LENSES; OPTICAL VARIABLES MEASUREMENT; REFRACTIVE INDEX; SILICON WAFERS;

IMMERSION LITHOGRAPHY; INDEX OF REFRACTION; MICROFLUIDIC SIMULATION; OPTICAL RETICLES;

PHOTOLITHOGRAPHY;

EID: 0141459706     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.497495     Document Type: Conference Paper

References (2)

1. M. Switkes and M. Rothschild, "Resolution Enhancement of 157 nm Lithography by Liquid Immersion," Journal of Microlithography, Microfabrication, and Microsystems, Vol. 1, No. 3, pp. 225-228, 2002.
2. J. Fay, Introduction to Fluid Mechanics, MIT Press, Cambrige, MA, 1994.