Lithography for sub-90 nm applications

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2002, Pages 3-8

  Van den hove, L ^a   Goethals, A M ^a   Ronse, K ^a   Van Bavel, M ^a   Vandenberghe, G ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; LENSES; LITHOGRAPHY; TECHNOLOGY;

EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL);

CMOS INTEGRATED CIRCUITS;

EID: 0036932189     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)

1. J. H. Burnett, Z.H. Levine and E. L. Shirley, "Intrinsic birefringence in calcium fluoride and barium fluoride", Physical Review B, vol. 64, 241102.
2. J.H. Burnett, Z.H. Levine and E.L. Shirley, "Intrinsic birefringence in crystalline optical materials: a new concern for lithography", Future Fab International issue 12, 2002.
3. J. Mulkens et al., "157nm Technology: where are we today", Proceedings SPIE vol. 4691, 2002, p. 613-625.
4. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
5. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
6. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp.
7. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
8. A. Grenville et al., "Behaviour of candidate organic pellicle materials under 157nm laser irradiation", Proceeding SPIE vol. 4691, 2002, p. 1644-1653.
9. R. French et al., "157nm pellicles: Polymer design for transparency and lifetime", Proceedings SPIE vol. 4691, 2002, p. 576-583.
10. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
11. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
12. S. Kodama et al., "Synthesis of novel Fluoropolymer for 147nm photoresist by cyclopolymerisation", Proceedings SPIE vol. 4690, 2002, p. 76-83.
13. M. Toriumi, N. Shida, H. Watanabe, T. Yamazaki, Seiichi Ishikawa and T. Itani, "Fluoropolymer resists for 157-nm lithography", Proceedings SPIE vol. 4690, 2002, p.191-199.
14. N. Shida, H. Watanabe, T. Yamazaki, S. Ishikawa, M. Toriumi, and T. Itani, "157nm single layer resists based on advanced Fluorinated polymers", Proceedings SPIE vol. 4690, 2002, p.497-503.
15. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
16. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
17. rd International Symposium on 157nm lithography, 3-6 September 2002, Antwerp, unpublished.
18. T. Suganagaet et al., "157nm lithography with high numerical aperture lens for the 70nm technology node", Proceedings SPIE vol. 4691, 2002, pp. 584-593.
19. G. Vandenberghe et al., "Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs", Proceedings SPIE vol. 4562, 2001, pp. 394-405.
20. T. Gau et al., "Customized illumination aperture filter for low kl photolithography process", Proceedings SPIE vol. 4000, 2000, pp. 271-282.
21. C. Pierrat et al., "New alternating phase-shifting mask conversion methodology using phase conflict resolution", Proceedings SPIE vol. 4691, 2002, pp. 325-335.
22. S. Hsu et al., "Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond", Proceedings SPIE vol 4691, 2002, pp. 476-490.
23. D. Van Den Broeke et al., "Complex 2D pattern lithography at lambda/4 resolution using chromeless phase lithography (CPL)", Proceedings SPIE vol. 4691, 2002, pp. 196-214.