Water immersion optical lithography for the 45nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 679-689

  Smith, Bruce W ^a   Kang, Hoyoung ^a   Bourov, Anatoly ^a   Cropanese, Frank ^a   Fan, Yongfa ^a  

^a Rochester Institute of Technology   (United States)

Author keywords

Excimer laser; Immersion; Optical extension; Optical lithography

Indexed keywords

ABERRATIONS; BIREFRINGENCE; EXCIMER LASERS; LIGHT ABSORPTION; OPTICS; REFRACTIVE INDEX; WATER;

IMMERSION IMAGING METHODS; OPTICAL EXTENSION;

PHOTOLITHOGRAPHY;

EID: 0141571346     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485489     Document Type: Conference Paper

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