Progress in 193-nm Single Layer Resists: The role of Photoacid Generator Structure on the Performance of Positive Resists

ACS Symposium Series

Volumn 706, Issue , 1998, Pages 224-236

  Allen, Robert D ^a   Opitz, Juliann ^a   Larson, Carl E ^a   Wallow, Thomas I ^a   DiPietro, Richard A ^a   Breyta, Gregory ^a   Sooriyakumaran, Ratnam ^a   Hofer, Donald C ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042914998     PISSN: 00976156     EISSN: None     Source Type: Book Series    
DOI: 10.1021/bk-1998-0706.ch017     Document Type: Article

References (20)

1. Allen, R.D.; "Progress in 193 nm Photoresists", Semiconductor International, September 1997, 72-80.
2. Allen, R. D.; Conley; W. E., Kunz, R. R.; "Deep UV Resist Technology", Chapter 4 in Handbook of Microlithography, Ed. P. Rai-Choudhury, SPIE Optical Engineering Press, Bellingham, WA, 1997.
3. Kaimoto, Y.; Nozaki, K.; Takechi, S.; Abe, N; Proc. SPIE 1992, 1672, 66.
4. Allen, R. D.; Wallraff, G. M.; Hinsberg, W. D.; and Kunz, R. R.; "Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists", Chapter 11 in ACS Symposium Series, No. 537, Polymers for Microelectronics, L. Thompson, C. G. Willson, and S. Tagawa, ACS, Washington, DC, 1994; Kunz, R. R.; Allen, R.D.; Hinsberg, W. D.; Wallraff, G. M.; Proc. SPIE, 1993, 1925, 167.
5. Allen, R. D.; Wallraff, G. M.; Hinsberg, W. D.; and Kunz, R. R.; "Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists", Chapter 11 in ACS Symposium Series, No. 537, Polymers for Microelectronics, L. Thompson, C. G. Willson, and S. Tagawa, ACS, Washington, DC, 1994; Kunz, R. R.; Allen, R.D.; Hinsberg, W. D.; Wallraff, G. M.; Proc. SPIE, 1993, 1925, 167.
6. Allen, R. D.; Wallraff, G. M.; Hinsberg, W. D.; and Kunz, R. R.; "Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists", Chapter 11 in ACS Symposium Series, No. 537, Polymers for Microelectronics, L. Thompson, C. G. Willson, and S. Tagawa, ACS, Washington, DC, 1994; Kunz, R. R.; Allen, R.D.; Hinsberg, W. D.; Wallraff, G. M.; Proc. SPIE, 1993, 1925, 167.
7. Allen, R. D.; Wallraff, G. M.; DiPietro, R. A.; Hofer, D. C.; Kunz, R. R.; Proc. SPIE 1995, 2438, 474.
8. Wallow, T. I.; Houlihan, F. M.; Nalamasu, O.; Chandross, E.; Neenan, T. X.; Reichmanis, E.; Proc. SPIE, 1996 2724, 355; Houlihan, F.; Wallow, T.; Nalamasu, O.; Reichmanis, E.; Macromolecules. 1997, 30, 6517.
9. Wallow, T. I.; Houlihan, F. M.; Nalamasu, O.; Chandross, E.; Neenan, T. X.; Reichmanis, E.; Proc. SPIE, 1996 2724, 355; Houlihan, F.; Wallow, T.; Nalamasu, O.; Reichmanis, E.; Macromolecules. 1997, 30, 6517.
10. Iwasa, S.; Maeda, K.; Nakano, K.; Ohfuji, T.; Hasagawa, E.; J. Photopolym. Sci. Technol., 1996, 9(3), 447.
11. Nozaki, K.. Watanabe, K. Yano, E. Kotachi, A.. Takechi, S and Hanyu, I. J. Photopolym. Sci. Technol., 1996, 9(3), 509.
12. Allen, R. D.; Sooriyakumaran, R.; Opitz, J.; Wallraff, G.; DiPietro, R.; Breyta, G.; Hofer, D.; Kunz, R.; Jayaraman, S.; Schick, R.; Goodall, B.; Okoroanyanwu, U.; Willson, C. G.; Proc. SPIE, 1996, 724, 334.
13. Wallraff, G. M.; Opitz, J.; Breyta, G.; Ito, H.; Fuller, B.; Proc. SPIE 1996, 2724 149.
14. Kihara, N.; Saito, S.; Ushirogouchi, T.; Nakase, M.; J. Photopolym. Sci. Technol. 1995, 8(4), 561.
15. Allen, R.; Sooriyakumaran, R.; Opitz, J.; Wallraff, G.; DiPietro, R.; Breyta, G.; Hofer, D.; Kunz, R.; Okoroanyanwu, U.; Willson, C. G.; J. Photopolym. Sci. Technol., 1996, 9(3), 465.
16. Kunz, R.; and Allen, R.; Proc. SPIE, 1994, 2195, 447.
17. Allen, R.; Opitz, J.; Larson, C.; Breyta, G., DiPietro, R.; Hofer, D.; Proc. SPIE, 1997, 3049, 44.
18. Allen, R.; Opitz, J.; Larson, C.; Wallow, T.; Breyta, G., DiPietro, R.; Sooriyakumaran, R.; Hofer, D.; J. Photopolym. Sci. Technol., 1997, 10(3), 503.
19. Ito, H.; Breyta, G.; Hofer, D.; Sooriyakumaran, R.; Petrillo, K.; Seeger, D.; J. Photopolym. Sci. Technol., 1994, 7(3), 433.
20. Beringer, F. M.; Jo. Amer. Chem. Soc., 1959, 81, 352.