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Volumn 20, Issue 10, 1997, Pages
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Progress in 193 nm photoresists
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Author keywords
[No Author keywords available]
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Indexed keywords
ACRYLICS;
COPOLYMERS;
ELECTRON TRANSPORT PROPERTIES;
ETCHING;
EXCIMER LASERS;
IMAGING SYSTEMS;
OLEFINS;
OPTICAL PROPERTIES;
POLYMERIZATION;
SEMICONDUCTOR DEVICE MANUFACTURE;
SILICON WAFERS;
ULTRAVIOLET RADIATION;
CHEMICALLY AMPLIFIED RESISTS;
DEEP ULTRAVIOLET LITHOGRAPHY;
ETCH RESISTANCE;
PHOTOSPEED;
PHOTORESISTS;
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EID: 0031233591
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (5)
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References (0)
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