Method of comparing chemical contrast with resist contrast

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 149-155

  Wallraff, Gregory M ^a   Opitz, Juliann ^a   Breyta, Gregory ^a   Ito, Hiroshi ^a   Fuller, Bruce M ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; CHEMISTRY; CROSSLINKING; DISSOLUTION; LITHOGRAPHY; PERFORMANCE; THICKNESS MEASUREMENT;

CHEMICALLY AMPLIFIED RESISTS; RESIST CONTRAST;

PHOTORESISTS;

EID: 0029727973     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241814     Document Type: Conference Paper

References (7)