Dielectric properties of YSZ high-k thin films fabricated at low temperature by pulsed laser deposition

Materials Letters

Volumn 57, Issue 26-27, 2003, Pages 4297-4301

  Zhu, J ^a   Liu, Z G ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

High k gate dielectrics; Pulsed laser deposition; YSZ thin films

Indexed keywords

CAPACITORS; CERAMIC MATERIALS; DIELECTRIC PROPERTIES; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; X RAY DIFFRACTION ANALYSIS;

EQUIVALENT OXIDE THICKNESS (EOT);

THIN FILMS;

EID: 0042729998     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00306-9     Document Type: Article

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