Study of the ignition behavior of a pulsed dc discharge used for plasma-assisted chemical-vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 423-434

  Beer, Thomas A ^a   Laimer, Johann ^a   Störi, Herbert ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTRIC DISCHARGES; ELECTRIC VARIABLES MEASUREMENT; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROBES; THICKNESS MEASUREMENT;

CHARGE PARTICLE DENSITY; GATEABLE IMAGE INTENSIFIER; LANGMUIR PROBE; PULSE DIRECT CURRENT DISCHARGE; SPATIAL LIGHT INTENSITY;

TITANIUM NITRIDE;

EID: 0034156371     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582204     Document Type: Article

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