The time development of pulsed-DC production plasmas used for deposition of TiN

Surface and Coatings Technology

Volumn 102, Issue 1-2, 1998, Pages 35-40

  Mogensen, K S ^a   Mathiasen, C ^b   Eskildsen, S S ^b   Stori H ^c   Bottiger J ^a  

^a AARHUS UNIVERSITY   (Denmark)

^b DANISH TECHNOLOGICAL INSTITUTE   (Denmark)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

PACVD; Pulsed DC; TiN

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; ELECTRIC CURRENT MEASUREMENT; ELECTRODES; EMISSION SPECTROSCOPY; LIGHT EMISSION; PLASMA APPLICATIONS;

OPTICAL EMISSION SPECTROSCOPY (OES); PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD); TITANIUM TETRACHLORIDE;

TITANIUM NITRIDE;

EID: 0032046428     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00528-8     Document Type: Article

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