Dynamics of pulsed d.c. discharges used for PACVD - effect of additional high voltage pulses

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 424-428

  Kugler, C ^a   Fink, M ^a   Laimer, J ^a   Stori H ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

PACVD; Plasma dynamics; Pulsed discharge; Titanium nitride; Uniform deposition

Indexed keywords

ELECTRIC REACTORS; GASES; GLOW DISCHARGES; IGNITION; SUBSTRATES;

PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD);

ELECTRIC POTENTIAL;

PLASMA TREATMENT;

EID: 0035386387     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01208-7     Document Type: Article

References (8)