Electrical properties of ultrathin TiO2 films on Si1-yCy heterolayers

Solid-State Electronics

Volumn 47, Issue 10, 2003, Pages 1793-1798

  Dalapati, G K ^a   Chatterjee, S ^a   Samanta, S K ^a   Nandi, S K ^a   Bose, P K ^b   Varma, S ^c   Patil, S ^c   Maiti, C K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

^b JADAVPUR UNIVERSITY   (India)

^c INSTITUTE OF PHYSICS   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; EPITAXIAL GROWTH; LEAKAGE CURRENTS; MOSFET DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

POOLE-FRENKEL EMISSION;

TITANIUM DIOXIDE;

EID: 0042092342     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(03)00161-8     Document Type: Conference Paper

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