Chemical vapor deposition of strontium ruthenate thin films from bis(2, 4-dimethylpentadienyl) ruthenium and bis(tetramethylheptanedionato) strontium

Materials Research Society Symposium - Proceedings

Volumn 495, Issue , 1998, Pages 51-55

  Breitkopf, Richard ^a   Meda, Lamartine J ^a   Haas, Terry ^a   Kirss, Rein U ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS MATERIALS; ANNEALING; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; POLYCRYSTALLINE MATERIALS; RUTHENIUM COMPOUNDS; SEMICONDUCTING SILICON; STRONTIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

HOT WALL CHEMICAL VAPOR DEPOSITION; RUTHENIUM DIOXIDE; STRONTIUM RUTHENATE;

CONDUCTIVE FILMS;

EID: 0031622146     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)