Properties of polycrystalline SrRuO3 thin films on Si substrates

Materials Research Bulletin

Volumn 32, Issue 1, 1997, Pages 83-96

  Watanabe, Koji ^a   Ami, Miho ^a   Tanaka, Masahiro ^a  

^a SONY CORPORATION   (Japan)

Author keywords

A. oxides; A. thin films; B. laser deposition; D. diffusion; D. electrical properties

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; DIFFUSION; ELECTRIC CONDUCTIVITY; MORPHOLOGY; OXIDES; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; SILICON; SUBSTRATES; SURFACES; THIN FILMS;

METALLIC CONDUCTIVITY; PULSED LASER DEPOSITION; SILICON SUBSTRATES; STRONTIUM RUTHENIUM OXIDES;

STRONTIUM COMPOUNDS;

EID: 0030783219     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(96)00165-1     Document Type: Article

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