Annealing of RuO2 and Ru bottom electrodes and its effects on the electrical properties of (Ba,Sr)TiO3 thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 1, 1998, Pages 284-289

  Ahn, Joon Hyung ^a   Choi, Won Youl ^a   Lee, Won Jae ^a   Kim, Ho Gi ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Annealing; Bottom electrode; BST; Evaporation; Leakage current; Reduction; Ru; RuO2

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; COMPOSITION EFFECTS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRODES; EVAPORATION; LEAKAGE CURRENTS; REDUCTION; RUTHENIUM COMPOUNDS; SURFACE STRUCTURE; THERMODYNAMIC STABILITY;

BOTTOM ELECTRODES; RUTHENIUM OXIDE;

THIN FILMS;

EID: 0031696433     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.37.284     Document Type: Article

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