New plasma source ion-implantation technique for inner surface modification of materials

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 111, Issue 1-2, 1996, Pages 187-189

  Sun, Mu ^a   Yang, S Z ^a   Li, B ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

INDUSTRIAL APPLICATIONS; PLASMA DENSITY; PLASMA SOURCES; SURFACE TREATMENT; TARGETS;

PLASMA SOURCE ION IMPLANTATION DEVICE; PLASMA UNIFORMITY; VACUUM CHAMBER;

ION IMPLANTATION;

EID: 0030123448     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01293-1     Document Type: Article

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