Energy-selective electron cyclotron resonance plasma for controlled surface reaction processes

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 102-104

  O'Keeffe, P ^a,b   Mutoh, H ^a   Den, S ^a   Hayashi, Y ^a   Komuro, S ^c   Morikawa, T ^c  

^a Irie Koken Co Ltd   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

^c TOYO UNIVERSITY   (Japan)

Author keywords

Aluminium oxide; Nitrogen; Plasma processing and deposition; X Ray photoelectron spectroscopy

Indexed keywords

DIFFUSION; ELECTRON CYCLOTRON RESONANCE; ION BEAMS; IONS; MAGNETIC FIELDS; MOLECULAR BEAM EPITAXY; NITRIDES; NITROGEN; REACTION KINETICS; SAPPHIRE; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; ALUMINUM OXIDE; ION ENERGY ANALYSIS; ION ENERGY DISTRIBUTION; LANGMUIR PROBE DIAGNOSTIC; OPTICAL EMISSION SPECTROSCOPY; PLASMA ASSISTED PROCESSING; SURFACE REACTION;

PLASMA SOURCES;

EID: 0030217695     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08585-9     Document Type: Article

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